Conference Papers
Year : 2007
Marielle Clot : Connect in order to contact the contributor
https://hal.science/hal-00394560
Submitted on : Friday, June 12, 2009-8:52:53 AM
Last modification on : Thursday, April 4, 2024-9:16:42 PM
Dates and versions
Identifiers
- HAL Id : hal-00394560 , version 1
Cite
M. Chouiki, H. Ridaoui, M. Zelsmann, J. Boussey-Said, J. de Girolamo. Low-k epoxy silsesquioxane resists for UV nanoimprint lithography. Nanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France. ⟨hal-00394560⟩
37
View
0
Download