Low-k epoxy silsesquioxane resists for UV nanoimprint lithography - Archive ouverte HAL Access content directly
Conference Papers Year : 2007
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hal-00394560 , version 1 (12-06-2009)

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  • HAL Id : hal-00394560 , version 1

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M. Chouiki, H. Ridaoui, M. Zelsmann, J. Boussey-Said, J. de Girolamo. Low-k epoxy silsesquioxane resists for UV nanoimprint lithography. Nanoimprint and Nanoprint Technology conference- NNT 2007, 2007, paris, France. ⟨hal-00394560⟩
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