Evolution of the lifetime model based on the Poole-Frenkel conduction for the SiOCH low-k dielectric used for the sub 65nm technologies - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2008

Evolution of the lifetime model based on the Poole-Frenkel conduction for the SiOCH low-k dielectric used for the sub 65nm technologies

Fichier non déposé

Dates et versions

hal-00386237 , version 1 (20-05-2009)

Identifiants

  • HAL Id : hal-00386237 , version 1

Citer

M. Vilmay, Daniel Roy, F. Volpi, J.M. Chaix. Evolution of the lifetime model based on the Poole-Frenkel conduction for the SiOCH low-k dielectric used for the sub 65nm technologies. Advanced Metallization Conference (AMC) 2008, 2008, United States. ⟨hal-00386237⟩

Collections

UGA CNRS SIMAP
46 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More