Article Dans Une Revue Journal of Vacuum Science and Technology Année : 2008

Modifications of dielectric films induced by plasma ashing processes: Hybrid versus porous SiOCH materials

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hal-00385675 , version 1 (19-05-2009)

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  • HAL Id : hal-00385675 , version 1

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Maxime Darnon, T. Chevolleau, T. David, N. Posseme, J. Ducote, et al.. Modifications of dielectric films induced by plasma ashing processes: Hybrid versus porous SiOCH materials. Journal of Vacuum Science and Technology, 2008, pp.B 26, 1964-1970. ⟨hal-00385675⟩
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