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Article Dans Une Revue Plasma Sources Science and Technology Année : 2005

New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes

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hal-00384291 , version 1 (14-05-2009)

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  • HAL Id : hal-00384291 , version 1

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G. Cunge, B. Pelissier, O. Joubert, R. Ramos, C. Maurice. New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes. Plasma Sources Science and Technology, 2005, pp.14 599. ⟨hal-00384291⟩
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