Accurate Synthesis of a Dual Linearly Polarized Reflectarray
Résumé
This paper presents a fast and accurate synthesis process applied to a printed reflectarray working in dual-polarization in Ku band. The used elementary cell is the slot-loaded patch offering numerous geometrical parameters to tune the desired reflected phase. Different cell selection strategies are proposed and compared to generate layouts with optimized characteristics. Three layouts have been designed, fabricated and measured in order to assess the proposed strategies.