Structure, mechanical and electrical properties of co-sputtered Cr-Si-N films versus their silicon content - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2007

Structure, mechanical and electrical properties of co-sputtered Cr-Si-N films versus their silicon content

Domaines

Matériaux
Fichier non déposé

Dates et versions

hal-00346272 , version 1 (11-12-2008)

Identifiants

  • HAL Id : hal-00346272 , version 1

Citer

D. Pilloud, C. Rousselot, C. Nouveau, L. Imhoff, J. Gavoille, et al.. Structure, mechanical and electrical properties of co-sputtered Cr-Si-N films versus their silicon content. International Colloquium on Plasma Processes CIP 2007, Jun 2007, France. ⟨hal-00346272⟩
21 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More