Mesoporous silica films with varying porous volume fraction: direct correlation between ortho-positronium annihilation decay and escape yield into vacuum - Archive ouverte HAL
Pré-Publication, Document De Travail Année : 2008

Mesoporous silica films with varying porous volume fraction: direct correlation between ortho-positronium annihilation decay and escape yield into vacuum

Résumé

The behavior of ortho-positronium (o-Ps) in mesoporous silica films implanted with low–energy positrons has been studied as a function of the film porous volume fraction. A lifetime spectrometer allowed determination of o-Ps annihilation decay both inside and outside of the film. A kinetic model is introduced that permits the determination of the yield and rate of escape of o-Ps into vacuum as well as the annihilation decay rate of the trapped o-Ps in the film. It is shown that these undergo a sudden change at a threshold porous volume fraction, above which the o-Ps escape rate to vacuum varies linearly with volume fraction.
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Dates et versions

hal-00344041 , version 1 (03-12-2008)
hal-00344041 , version 2 (02-09-2009)

Identifiants

  • HAL Id : hal-00344041 , version 1

Citer

Liszkay Laszlo, Catherine Corbel, Lorraine Raboin, Jean-Pierre Boilot, P. Perez, et al.. Mesoporous silica films with varying porous volume fraction: direct correlation between ortho-positronium annihilation decay and escape yield into vacuum. 2008. ⟨hal-00344041v1⟩
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