Understanding CO-stripping mechanism from Ni<sub>UPD</sub>/Pt(1 1 0) in view of the measured nickel formal partial charge number upon underpotential deposition on platinum surfaces in sulphate media - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Electrochimica Acta Année : 2007

Understanding CO-stripping mechanism from NiUPD/Pt(1 1 0) in view of the measured nickel formal partial charge number upon underpotential deposition on platinum surfaces in sulphate media

Résumé

We recently showed nickel-underpotential deposition (Ni-UPD) occurs on polycrystalline or single crystal platinum electrodes in acidic media. Whereas the decoupling of the nickel and hydrogen adsorption/desorption peaks is difficult for low pH, these processes can be better separated for higher pH values, typically pH > 3. However, even for platinum single crystals, high pH solutions do not enable to sufficiently separate nickel from hydrogen phenomena. As a result, electrochemistry alone cannot yield important information about Ni-UPD, such as the formal partial charge number (valency of electrosorption) and the role of the sulphate or hydrogen sulphate anions.

So, we decided to couple cyclic voltammetry to electrochemical quartz crystal microbalance (EQCM). EQCM measurements enable to decorrelate the simultaneous hydrogen and nickel adsorption/desorption peaks, which we could not attempt solely with electrochemistry. The coupling between gravimetric and electrochemical measurements allows us to detect the contribution of the anions and thus to isolate that of nickel: nickel coverage can then be determined. Nearly 4/5 NiUPD monolayer (θNi ≈ 0.8) over platinum is reached at nickel equilibrium potential for high pH solutions (5.5). The QCM and electrochemistry coupling further allows the determination of nickel formal partial charge number: ιNi,EQCM = 1.3 ± 0.13. Direct electrochemistry measurements (Swathirajan and Bruckenstein method) yield: ιNi,Pt(poly) = 1.5 ± 0.17. These two values are close, which validates the electrochemical method for the nickel/platinum system. In consequence, we used Swathirajan and Bruckenstein method for Pt(1 1 0)-(1 × 2) crystal and found: ιNi,Pt(1 1 0) ≈ 1.4 ± 0.1. Whatever the system (NiUPD/Pt(poly) or NiUPD/Pt(1 1 0)-(1 × 2)) or the experimental technique, nickel formal partial charge number is lower than nickel cation charge: ιNi < zNi = 2. In consequence, upon underpotential deposition on platinum surfaces, nickel cations discharge and then undergo additional charge exchange processes, such as anion (or water) adsorption, resulting in apparent partial nickel cation discharge. Moreover, NiUPD/Pt(1 1 0) surface displays high activity towards COad oxidation reaction. We explain such positive effect by the possible existence of a bifunctional mechanism in which oxygenated-species-covered NiUPD adatoms provide the oxygen atom to COad...Pt species, enabling its facile oxidation.

Domaines

Matériaux

Dates et versions

hal-00333730 , version 1 (23-10-2008)

Identifiants

Citer

Marian Chatenet, Yvonne Soldo-Olivier, Eric Chaînet, René Faure. Understanding CO-stripping mechanism from NiUPD/Pt(1 1 0) in view of the measured nickel formal partial charge number upon underpotential deposition on platinum surfaces in sulphate media. Electrochimica Acta, 2007, 53 (2), pp. 369-376. ⟨10.1016/j.electacta.2007.01.029⟩. ⟨hal-00333730⟩
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