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Communication Dans Un Congrès Année : 2007

Tailoring of silicon nanoparticles in a rf silane-based discharge using very low gas temperatures

Résumé

Dust particle growth in silane-based plasmas has been widely studied at room temperature and effects of higher gas temperatures are now well-attested [1,2]. However, effects of very low gas temperatures (below 0°C) on the dust formation are still little-known. In the present study, we grow silicon nanocrystals [3] from room temperature down to -40°C. We first show that low gas temperature increases dust formation kinetics. These results are consistent with the ones previously obtained at higher gas temperature, underlining an exponential behavior of the formation kinetics versus gas temperature. Moreover, as the plasma behaves like a supersaturated medium, silicon nanoparticle radius is expected to evolve as 1/T(K). At room temperature, single-crystal nanoparticles have a typical size of 1.5 nm in radius. First results at low gas temperature are very promising: spherical nanoparticles up to 40 nm in radius have been obtained for T= -40°C. These first insights into low gas temperature effects tend to confirm the hypothesis of a fast increasing radius for gas temperature below 0°C. Presently, TEM analyses are underway to determine a possible influence of the gas temperature on the nanoparticle crystalline phase and/or density in the plasma. This new method for silicon nanocrystal tailoring allows obtaining silicon nanoparticles in a size range of 1 to 40 nm with a quite monodispersed size distribution and a well-known density. This new technique can be of great interest for industrial applications requiring nanoparticles of well-defined size (photovoltaic applications, nanotechnologies...). [1] A. Fridman, L. Boufendi, T. Hbid, B. Potapkin, and A. Bouchoule, J.Appl.Phys. 79, 1303 (1995) [2] A. Bouchoule, A. Plain, L. Boufendi, J. Ph.Blondeau and C. Laure, ,J.Appl.Phys. 70, 1991 (1991) [3] M. Cavarroc, M. Mikikian, G. Perrier, L. Boufendi, Appl. Phys. Lett. 89, 013107 (2006)
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Dates et versions

hal-00332826 , version 1 (21-10-2008)

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  • HAL Id : hal-00332826 , version 1

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Marjorie Cavarroc, Maxime Mikikian, Yves Tessier, Laïfa Boufendi. Tailoring of silicon nanoparticles in a rf silane-based discharge using very low gas temperatures. 16th International Colloquium on Plasma Processes (CIP), Jun 2007, Toulouse, France. ⟨hal-00332826⟩
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