Characterization of in-plane structures of vapor deposited thin-films of distyryl-oligothiophenes bygrazing incidence X-ray diffractometry - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Crystal Research and Technology Année : 2007

Characterization of in-plane structures of vapor deposited thin-films of distyryl-oligothiophenes bygrazing incidence X-ray diffractometry

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hal-00303624 , version 1 (22-07-2008)

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  • HAL Id : hal-00303624 , version 1

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N. Yoshimoto, K. Aosawa, T. Taniswa, K. Omote, J. Ackermann, et al.. Characterization of in-plane structures of vapor deposited thin-films of distyryl-oligothiophenes bygrazing incidence X-ray diffractometry. Crystal Research and Technology, 2007, 12, pp.1228-1231. ⟨hal-00303624⟩
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