Contacting individual Fe(110) dots in a single electron-beam lithography step
Résumé
We report on a new approach, entirely based on electron-beam lithography technique, to contact electrically, in a four-probe scheme, single nanostructures obtained by self-assembly. This technique has been developed to study the field-induced reversal of an internal component of an asymmetric Bloch domain wall observed in elongated structures such as Fe(110) dots. We have focused on the control, using an external magnetic field, of the magnetisation oriention within Néel caps that terminate the domain wall at bot interfaces. Preliminary magneto-transport measurements are discussed demonstrating clearly that a single Fe(110) dot has been contacted
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