Magnetization reversal of nanostructured tunnel junctions from prepatterned substrates - Archive ouverte HAL
Article Dans Une Revue Journal of Applied Physics Année : 2008

Magnetization reversal of nanostructured tunnel junctions from prepatterned substrates

Résumé

Nanostructured tunnel junctions with composition Al2O3/Ta/Ru/Mn51.5Pt48.5/Co90Fe10/Al oxidized/Co90Fe10/Ni81Fe19/Ta were prepared on prepatterned silicon substrates, consisting of rectangular dots with dimensions as small as 100×400 nm2 and different spacings. Reduced lateral dimensions lead to an enhancement of the exchange bias field by comparison to continuous films. Magnetic force microscopy images taken at remanence indicate a mixture of magnetic states corresponding to the different relative orientations of the magnetizations of the pinned and the free layers. Significant dipolar interactions between the dots also proved to contribute to the complexity of the magnetization reversal of the stacks.

Dates et versions

hal-00260807 , version 1 (05-03-2008)

Identifiants

Citer

A. Bollero, V. Baltz, B. Dieny, B. Negulescu, M. Rickart, et al.. Magnetization reversal of nanostructured tunnel junctions from prepatterned substrates. Journal of Applied Physics, 2008, 103 (7), pp.07C108. ⟨10.1063/1.2830961⟩. ⟨hal-00260807⟩
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