Ta2O5 thin films for integrated circuits applications elaborated by electrostatic spray deposition: SEM and TEM characterizations. - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2007

Ta2O5 thin films for integrated circuits applications elaborated by electrostatic spray deposition: SEM and TEM characterizations.

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hal-00212049 , version 1 (22-01-2008)

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  • HAL Id : hal-00212049 , version 1

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A. Lintanf, P. Donnadieu, E. Djurado. Ta2O5 thin films for integrated circuits applications elaborated by electrostatic spray deposition: SEM and TEM characterizations.. Xème Colloque de la Société Française des Microscopies, Jun 2007, France. ⟨hal-00212049⟩

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