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Communication Dans Un Congrès Année : 2002

Optical interferometry investigation of internal stress and opto–mechanical characteristics of silicon oxynitride thin films fabricated by PECVD

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hal-00104515 , version 1 (06-10-2006)

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  • HAL Id : hal-00104515 , version 1

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C. Gorecki, M. Jozwik, A. Sabac. Optical interferometry investigation of internal stress and opto–mechanical characteristics of silicon oxynitride thin films fabricated by PECVD. May 2002, pp.TOME 4755. ⟨hal-00104515⟩
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