Influence of the substrate/photo-active solution interaction in patterning and adhesion of photo-deposited films - Archive ouverte HAL
Article Dans Une Revue Applied Surface Science Année : 2005

Influence of the substrate/photo-active solution interaction in patterning and adhesion of photo-deposited films

Résumé

Using the photo-chemical deposition of chromium hydroxide layers driven by a continuous Ar+ laser wave in a potassium chromate solution, we explored the adhesion and patterning properties of the induced deposit on glass substrates versus the composition and the pH of the photo-active solution. The experiments were performed with two interfering beams imprinting an optical pattern on the substrate and analyzing the resulting morphology of the deposit. The solubility, patterning and adhesion are investigated using both organic (acetic acid) and inorganic (HCl) acids. The observed adhesion as a function of the pH in the photo-deposition process (surface versus bulk) was compared for several substrates.

Domaines

Matériaux
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Dates et versions

hal-00095271 , version 1 (15-05-2009)

Identifiants

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Emmanuel Hugonnot, Marie-Hélène Delville, Jean-Pierre Delville. Influence of the substrate/photo-active solution interaction in patterning and adhesion of photo-deposited films. Applied Surface Science, 2005, vol. 248 (1-4), pp.479-483. ⟨10.1016/j.apsusc.2005.03.068⟩. ⟨hal-00095271⟩

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