Conference Papers
Year : 2001
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https://hal.science/hal-00009935
Submitted on : Friday, October 7, 2005-12:12:34 PM
Last modification on : Friday, August 4, 2023-3:09:31 PM
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- HAL Id : hal-00009935 , version 1
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J. Keranen, S. Ek, E. Iiskola, A. Auroux, L. Niinisto. Controlled formation of thin V2O5 layers on silica by atomic layer deposition. 2001, pp.CD-Rom. ⟨hal-00009935⟩
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