@phdthesis{fuard:tel-00006610, TITLE = {{Etude et caract{\'e}risation avanc{\'e}es des proc{\'e}d{\'e}s plasma pour les technologies sub - 0.1 $\mu$m}}, AUTHOR = {Fuard, David}, URL = {https://theses.hal.science/tel-00006610}, SCHOOL = {{Universit{\'e} d'Orl{\'e}ans}}, YEAR = {2003}, MONTH = Nov, KEYWORDS = {plasma etching ; low-K etching ; bow ; bowing effect ; graphitization phenomenon ; contact holes ; faceting ; charging effects ; ions transverse temperature ; silicon oxide etching. ; gravure oxyde de silicium ; gravure plasma ; gravure de mat{\'e}riaux {\`a} faible permittivit{\'e} di{\'e}lectrique ; low-K ; SiLKā„¢ ; bowing ; XPS ; graphitisation ; trous de contact ; facette ; effets de charge ; temp{\'e}rature transverse des ions ; gravure oxyde de silicium.}, TYPE = {Theses}, PDF = {https://theses.hal.science/tel-00006610/file/tel-00006610.pdf}, HAL_ID = {tel-00006610}, HAL_VERSION = {v1}, }