Determination of N and O Atom Density in Ar-N 2-H 2 and Ar-O 2-H 2 Flowing Microwave Post Discharges - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal de Physique III Année : 1996

Determination of N and O Atom Density in Ar-N 2-H 2 and Ar-O 2-H 2 Flowing Microwave Post Discharges

T. Czerwiec
  • Fonction : Auteur
J. Gavillet
  • Fonction : Auteur
T. Belmonte
H. Michel
  • Fonction : Auteur
André Ricard
  • Fonction : Auteur
  • PersonId : 1075726
  • IdRef : 050545329

Résumé

Number densities of N and O atoms have been determined using NO titration in Ar-N2, Ar-N2-H2, Ar-O2 and Ar-O2-H2 flowing microwave (2 450 MHz) post-discharges at 300 and 1500 Pa. The NO titration scheme is discussed from a kinetics point of view and applied to the high dilution of molecular gases in argon. The N/N2 density ratio is enhanced by a factor 3 when small quantities of H2 are introduced in Ar-N2 discharges. The high O/O2 density ratio obtained in Ar-O2 post-discharges (0.5 to 0.6) are probably due to adsorbed H2O that inhibits surface recombination of O-atom. The effect of H2 addition in Ar-O2 microwave discharge at 1500 Pa is to decrease the O atom density by homogeneous reaction involving H atoms and OH radicals.

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jpa-00249518 , version 1 (04-02-2008)

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T. Czerwiec, J. Gavillet, T. Belmonte, H. Michel, André Ricard. Determination of N and O Atom Density in Ar-N 2-H 2 and Ar-O 2-H 2 Flowing Microwave Post Discharges. Journal de Physique III, 1996, 6 (9), pp.1205-1212. ⟨10.1051/jp3:1996179⟩. ⟨jpa-00249518⟩

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