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Article Dans Une Revue Journal de Physique III Année : 1994

Curvature effect in grazing X-ray reflectometry

Résumé

Grazing X-ray reflectometry is currently used for the characterization of thin layer stacks. The parameters to be determined are thickness, roughness, and optical index. They can be worked out by fitting the recorded reflectivity curve, with a theoretical one calculated with the appropriate parameters. In such a calculation, the sample is supposed to be flat. It can be shown experimentally that the curvature of the sample modifies the expected reflectivity. An example of a saddle shaped sample, with opposite main curvature in two perpendicular directions shows typical differences on recorded curves for these two perpendicular directions. In order to make a quantitative study of the effect of the sample curvature, five pairs of spherical silica substrates have been made and coated with similar TiN layers. A theoretical study has also been made. It is shown that, for a given set-up, the sample curvature changes the aperture of the reflected beam with respect to that of the incident beam. At grazing incidence, the aperture change is significant in the incidence plane, while it can be neglected in the plane perpendicular to the incidence plane. As a consequence of the aperture change, the recorded intensity can be increased or decreased, depending on the position of the source image with respect to the position and width of the stop aperture in the image space. A calculation has been made, taking into account the geometrical characteristics of the equipment. The results have been compared with the reflectivity curves measured for the TiN layers deposited on the curved silica substrates. It can be seen that the anomalies in the reflectivity curves, induced by the substrate curvature in the plateau region are well accounted for by the model.


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jpa-00249201 , version 1 (04-02-2008)

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Françoise Bridou. Curvature effect in grazing X-ray reflectometry. Journal de Physique III, 1994, 4 (9), pp.1513-1522. ⟨10.1051/jp3:1994218⟩. ⟨jpa-00249201⟩
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