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              <p>The work introduces a multifunctional diffractive optical element (DOE) designed to achieve precise mode control in photonic microcavities, specifically Cavity Resonator Integrated Grating Filters (CRIGFs). Traditional mode-selective excitation often relies on bulky, costly phase-only spatial light modulators (SLMs), which hinder integration into compact systems.The proposed DOE is a binary phase mask that simultaneously handles phase modulation, effective amplitude shaping (via duty-cycle), and focusing within a single compact device. Its design combines gradient-based numerical optimization with physics-based rules, balancing mode selectivity against scattering losses. Fabricated through standard single-level photolithography, the DOE is compatible with established semiconductor manufacturing. Experimental results demonstrate selective excitation of higher-order CRIGF modes, confirmed by transmission spectra with clear resonance dips. Compared with SLM-based systems, the DOE reduces complexity, size, and cost while retaining flexibility. Future applications include few-mode fiber systems for data multiplexing and integration into collimators or coupling optics, paving the way for highly compact, multifunctional photonic devices.</p>
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              <p>Ce travail présente un élément optique diffractif multifonctionnel (DOE) conçu pour assurer un contrôle précis des modes dans des microcavités photoniques, en particulier les filtres à réseau intégrés résonants de cavité (CRIGF). Les méthodes classiques d’excitation sélective de modes reposent souvent sur des modulateurs spatiaux de phase (SLM) encombrants et coûteux, qui limitent leur intégration dans des systèmes compacts.Le DOE proposé est un masque binaire de phase qui assure simultanément la modulation de phase, le façonnage effectif de l’amplitude (via le rapport cyclique) et la focalisation dans un composant unique et compact. Sa conception combine une optimisation numérique par gradient avec des règles physiques, conciliant sélectivité des modes et pertes par diffusion. Fabriqué par photolithographie standard à un seul niveau, le DOE est compatible avec les procédés de fabrication semi-conducteurs établis.Les résultats expérimentaux démontrent l’excitation sélective de modes d’ordre supérieur dans le CRIGF, confirmée par des spectres de transmission présentant des résonances marquées. Comparé aux systèmes basés sur SLM, le DOE réduit la complexité, la taille et le coût tout en conservant une grande flexibilité. Parmi les perspectives d’application figurent les systèmes à fibres à quelques modes pour le multiplexage de données et l’intégration dans des collimateurs ou des optiques de couplage, ouvrant la voie à des dispositifs photoniques multifonctionnels et très compacts.</p>
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              <country key="FR"/>
            </address>
            <ref type="url">https://www.univ-tlse3.fr/</ref>
          </desc>
          <listRelation>
            <relation active="#struct-443875" type="direct"/>
          </listRelation>
        </org>
      </listOrg>
    </back>
  </text>
</TEI>