Chapitre D'ouvrage Année : 2021

Study of Microwave Afterglows in N2 Gas Mixtures by Emission Spectroscopy and LIF. Application to Surface Cleaning

Résumé

Variations of N, H, O and C-atoms density have been determined along the reduced pressure flowing afterglows of microwave Ar-N2-H2 discharges that have been experimented in Plasmas Labs of Nancy, Montreal, Orsay and Toulouse. The active species density is obtained by NO titration for N and O-atoms and by line intensity ratios for the H and C-atoms. The results obtained by LIF measurements in Orsay and Toulouse Labs are reported for N and H –atoms. The surface cleaning by N and O-atoms has been experimented.

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Dates et versions

hal-05055580 , version 1 (05-05-2025)

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André Ricard, Gérard Baravian, Jayr Amorim, F. Gaboriau, Mireille Gaillard. Study of Microwave Afterglows in N2 Gas Mixtures by Emission Spectroscopy and LIF. Application to Surface Cleaning. Plasmas afterglows with N2 for Surface Treatments, Book Publisher International (a part of SCIENCEDOMAIN International), pp.32-55, 2021, ⟨10.9734/bpi/mono/978-93-91595-70-8/CH2⟩. ⟨hal-05055580⟩
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