Study of Microwave Afterglows in N2 Gas Mixtures by Emission Spectroscopy and LIF. Application to Surface Cleaning
Résumé
Variations of N, H, O and C-atoms density have been determined along the reduced pressure flowing afterglows of microwave Ar-N2-H2 discharges that have been experimented in Plasmas Labs of Nancy, Montreal, Orsay and Toulouse. The active species density is obtained by NO titration for N and O-atoms and by line intensity ratios for the H and C-atoms. The results obtained by LIF measurements in Orsay and Toulouse Labs are reported for N and H –atoms. The surface cleaning by N and O-atoms has been experimented.