Communication Dans Un Congrès Année : 2019

Silicon carbonitride thin films prepared by radiofrequency magnetron sputtering on Si (100) and nitrided Si (100) enhanced by an ECR plasma source

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hal-04871652 , version 1 (07-01-2025)

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  • HAL Id : hal-04871652 , version 1

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Christine Robert-Goumet, G. Monier, Abdellatif Bachar, Eric Tomasella, A. Bousquet, et al.. Silicon carbonitride thin films prepared by radiofrequency magnetron sputtering on Si (100) and nitrided Si (100) enhanced by an ECR plasma source. ECSAIA’19, 18th European Conference on Applications of Surface and Interface Analysis, Sep 2019, Dresde (Germany), Germany. ⟨hal-04871652⟩
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