Measuring negative ion yield and work function from phosphorus doped diamond, boron doped diamond, and graphite in deuterium plasmas
Résumé
Negative-ion sources are of considerable interest for applications such as materials processing and neutral beam injection for magnetic confinement fusion. The efficient production of negative ions in these sources often relies on surface production in which positive ions from the plasma bombard the surface, capture electrons and backscatter as negative ions. Alternatively, the positive ions can be adsorbed onto the surface and subsequently sputtered as negative ions. The exposure of these surfaces to plasma at various temperatures modifies their surface state and hence, their ability to produce negative ions.
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