Investigating ultra-thin Ag and Au layers using spectrophotometry and AFM imaging - Archive ouverte HAL
Article Dans Une Revue Journal of the European Optical Society : Rapid publications Année : 2024

Investigating ultra-thin Ag and Au layers using spectrophotometry and AFM imaging

Riley Shurvinton
Valentin Allard
  • Fonction : Auteur
Aude L. Lereu
Antonin Moreau
  • Fonction : Auteur
Fabien Lemarchand
  • Fonction : Auteur
  • PersonId : 846494
Julien Lumeau

Résumé

A spectrophotometric method is demonstrated for refractive index and thickness determination of thin and ultrathin metallic films. The method involves a three-layer stack where the metallic layer of interest is deposited on an opaque Si wafer coated with SiO 2 . This stack creates oscillations in the reflectance spectrum, which are highly sensitive to the index of the metallic film, allowing precise determination of the index of layers down to 1 nm. Experimental index values are given for Ag and Au over the wavelength range of 370–835 nm. These results are correlated with Atomic force microscopy (AFM) images of the films, which reveal dramatic changes in structure for layers of different thickness.
Fichier principal
Vignette du fichier
2024_Rileyjeos20230060.pdf (2.56 Mo) Télécharger le fichier
Origine Fichiers éditeurs autorisés sur une archive ouverte
Licence

Dates et versions

hal-04735379 , version 1 (12-11-2024)

Licence

Identifiants

Citer

Riley Shurvinton, Valentin Allard, Aude L. Lereu, Antonin Moreau, Fabien Lemarchand, et al.. Investigating ultra-thin Ag and Au layers using spectrophotometry and AFM imaging. Journal of the European Optical Society : Rapid publications, 2024, 20 (1), pp.8. ⟨10.1051/jeos/2024005⟩. ⟨hal-04735379⟩
52 Consultations
35 Téléchargements

Altmetric

Partager

More