Distortion pre-compensation in soft nanoimprint process for mix-and-match process with traditional UV lithography - Archive ouverte HAL
Poster De Conférence Année : 2024

Distortion pre-compensation in soft nanoimprint process for mix-and-match process with traditional UV lithography

Pré-compensation des distortions causés par nanoimpression souple pour procédé mix-and-match utilisant la lithographie UV traditionnelle

Résumé

Since its development by Stephen Y. Chou in 1996, Soft nanoimprint lithography [S-NIL] has proved to be a promising technique for replicating patterns from a master mold to another target substrate, being both quick and cost-effective compared to other lithography technologies. These properties make SNIL a strong candidate for the fabrication of cm-scale active metasurfaces. Indeed, the fabrication of active metasurfaces requires addressing independent control over each single nano-resonator of the pattern. Using SNIL in a mix-and-match process could then allow for the control of the nano-resonators on a bigger scale.
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Dates et versions

hal-04711025 , version 1 (26-09-2024)

Identifiants

  • HAL Id : hal-04711025 , version 1

Citer

Léopold Boudier, Tanneguy Blandin, Jean Baptiste Doucet, Emmanuelle Daran, Franck Carcenac, et al.. Distortion pre-compensation in soft nanoimprint process for mix-and-match process with traditional UV lithography. Micro Nano Engineering 2024 (MNE2024), Sep 2024, Montpellier, France. . ⟨hal-04711025⟩
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