Optimization of etching parameters of chalcogenide layers for photonic integrated circuits for Near and Mid-Infrared applications - Archive ouverte HAL
Communication Dans Un Congrès Année : 2024

Optimization of etching parameters of chalcogenide layers for photonic integrated circuits for Near and Mid-Infrared applications

Fichier non déposé

Dates et versions

hal-04652694 , version 1 (18-07-2024)

Identifiants

  • HAL Id : hal-04652694 , version 1

Citer

Abdelali Hammouti, Sofiane Meziani, Loïc Bodiou, Nathalie Lorrain, Parastesh Pirasteh, et al.. Optimization of etching parameters of chalcogenide layers for photonic integrated circuits for Near and Mid-Infrared applications. 10th International Conference on Optical, Optoelectronic and Photonic Materials and Applications, Jun 2024, Pardubice, Czech Republic. ⟨hal-04652694⟩
15 Consultations
0 Téléchargements

Partager

More