Growth of Sb$_2$Te$_3$ thin films on Ge(111) sample by thermal deposition: Morphological and electronic properties - Archive ouverte HAL
Article Dans Une Revue Physica E: Low-dimensional Systems and Nanostructures Année : 2024

Growth of Sb$_2$Te$_3$ thin films on Ge(111) sample by thermal deposition: Morphological and electronic properties

Résumé

Sb$_2$Te$_3$ is a well-known thermoelectric material and a topological insulator and its utilization is foreseen for many applications, such as quantum computing, mode-locking of laser systems, and cooling systems. Various methods have been used to grow thin Sb$_2$Te$_3$ films on different substrates, such as molecular beam epitaxy or electrodeposition. Often, such methods require performing laborious and rigid steps in order to optimize film growth and reduce the amount of defects. For this reason, we investigate a simplified growth method: thermal deposition starting from Sb$_2$Te$_3$ lumps followed by annealing. By means of various surface science techniques (LEED, STM, XPS), we show that it is possible to obtain a single crystalline Sb$_2$Te$_3$Te film on a Ge(111) substrate. The film, which is amorphous after deposition, undergoes a phase transition and becomes crystalline after annealing at 573 K. This is clearly shown by a 1x1 surface termination typical of a (0001) surface with hexagonal lattices. The presence of several quintuple-layer steps was observed by scanning tunneling microscopy. Photoelectron spectroscopy characterization confirms that the grown chalcogenide film presents the expected stoichiometry (Te/Sb=1.5). The proposed method simplifies the growth phase and seems to reduce the number of defects induced by the growth technique, major advantages for many applications.
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Dates et versions

hal-04638972 , version 1 (16-07-2024)

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Marco Minissale, Eric Salomon, Konstantinos Iliopoulos, Julien Lumeau, Thierry Angot. Growth of Sb$_2$Te$_3$ thin films on Ge(111) sample by thermal deposition: Morphological and electronic properties. Physica E: Low-dimensional Systems and Nanostructures, 2024, 160, pp.115952. ⟨10.1016/j.physe.2024.115952⟩. ⟨hal-04638972⟩
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