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                <term xml:lang="en">Electromagnetic interference</term>
                <term xml:lang="en">Cardiovascular implantable electronic device</term>
                <term xml:lang="en">Extremely low frequency</term>
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              <p>Objective. The possibility of interference by electromagnetic fields in the workplaces with cardiac implants is a concern for both individuals and employers. This article presents an analysis of the interference to which cardiac implants are subjected under high-intensity electric field at the power frequency. Approach. Evaluations of interference were conducted by studying the induced voltages at the device input in the real case study and the substitute study, and establishing an association between them with the equivalence factor F. A funnel-shaped phantom, designed for in vitro testing and representing the electrical characteristics of the locations where cardiac implants are installed, was used in the substitute study. A measuring system was implemented to measure the induced voltage at the device input under high intensity electric fields. Main results. The induced voltages obtained in the experimental measurements align with the findings of the numerical study in the phantom. By applying the equivalence factors derived between the real case study and the substitute study (2.39 for unipolar sensing; 3.64 for bipolar sensing), the induced voltages on the cardiac implants can be determined for the real case using the substitute experimental set-up. Significance. The interference voltages on the cardiac implants under EF exposures at low frequency were experimentally measured with detailed description. The findings provide evidence for an analysis method to systematically study the electromagnetic interference on the cardiac implants at low frequency.</p>
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              <p>Objectif. La possibilité d'interférence par des champs électromagnétiques sur les lieux de travail avec des implants cardiaques est une préoccupation pour les individus et les employeurs. Cet article présente une analyse de l'interférence à laquelle les implants cardiaques sont soumis sous un champ électrique de haute intensité à la fréquence de puissance. Approche. Les évaluations des interférences ont été réalisées en étudiant les tensions induites à l'entrée de l'appareil dans l'étude de cas réelle et l'étude de substitution, et en établissant une association entre elles avec le facteur d'équivalence F. Un fantôme en forme d'entonnoir, conçu pour les tests in vitro et représentant les caractéristiques électriques des endroits où les implants cardiaques sont installés, a été utilisé dans l'étude de substitution. Un système de mesure a été mis en place pour mesurer la tension induite à l'entrée de l'appareil sous des champs électriques de haute intensité. Principaux résultats. Les tensions induites obtenues lors des mesures expérimentales sont en accord avec les résultats de l'étude numérique dans le fantôme. En appliquant les facteurs d'équivalence dérivés entre l'étude de cas réelle et l'étude de substitution (2,39 pour la détection unipolaire; 3,64 pour la détection bipolaire), les tensions induites sur les implants cardiaques peuvent être déterminées pour le cas réel en utilisant le dispositif expérimental de substitution. Signification. Les tensions d'interférence sur les implants cardiaques exposés aux champs électriques à basse fréquence ont été mesurées expérimentalement avec une description détaillée. Les résultats fournissent des preuves pour une méthode d'analyse permettant d'étudier systématiquement l'interférence électromagnétique sur les implants cardiaques à basse fréquence.</p>
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              <p>摘要目的。工作场所的电磁场对心脏植入物的干扰可能性是个人和雇主关心的问题。本文分析了心脏植入物在高强度电场下受到的干扰情况。方法。通过研究实际案例研究和替代研究中设备输入端的感应电压，并通过等效因子F将它们关联起来，进行干扰评估。在替代研究中使用了一个漏斗形模型，该模型设计用于体外测试，代表了心脏植入物安装位置的电气特性。我们建立了一个测量系统，用于测量高强度电场下设备输入端的感应电压。主要结果。实验测量中获得的感应电压与模型仿真中的数值研究结果一致。通过应用实际案例研究和替代研究之间得出的等效因子（单极导线为2.39；双极导线为3.64），可以使用替代实验装置确定实际案例中心脏植入物的感应电压。意义。详细描述了低频电场曝光下心脏植入物的干扰电压的实验测量。研究结果为系统分析低频电磁干扰对心脏植入物的影响提供了证据。</p>
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