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            <funder>This project received funding from the European Union’s Horizon 2020 research and innovation program under the Marie Sklodowska-Curie grant agreement no. 847568. The authors thank the French National Research Agency (STORE-EX Labex Project ANR-10-LABX-76-01 and ARTEMIS ANR project). The French RENATECH network and the University of Lille are greatly acknowledged for supporting the Center of MicroNanoFabrication (CMNF) facility from IEMN. The authors also want to thank the Department of Materials Science and Engineering (UCLA) for the use of XPS facilities, Centre de Microcaractérisation Raimond Castaing (Toulouse, France) for the use of GDOES facilities, and Chevreul Institute (FR 2638) for funding XRD and TEM facilities. This work received funding from the CPER Hauts de France project IMITECH and MEL. Partial support at UCLA was provided by the Office of Naval Research (N00014-23-1-2667).</funder>
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              <p>The demand for high-performance energy storage devices to power Internet of Things applications has driven intensive research on micro-supercapacitors (MSCs). In this study, RuN films made by magnetron sputtering as an efficient electrode material for MSCs are investigated. The sputtering parameters are carefully studied in order to maximize film porosity while maintaining high electrical conductivity, enabling a fast charging process. Using a combination of advanced techniques, the relationships among the morphology, structure, and electrochemical properties of the RuN films are investigated. The films are shown to have a complex structure containing a mixture of crystallized Ru and RuN phases with an amorphous oxide layer. The combination of high electrical conductivity and pseudocapacitive charge storage properties enabled a 16 µm-thick RuN film to achieve a capacitance value of 0.8 F cm$^{−2}$ in 1 m KOH with ultra-high rate capability.</p>
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