Study of curtaining effect reduction methods in Inconel 718 using a plasma focused ion beam - Archive ouverte HAL
Article Dans Une Revue Journal of Microscopy Année : 2024

Study of curtaining effect reduction methods in Inconel 718 using a plasma focused ion beam

S. Desbief
  • Fonction : Auteur
J. Silvent
  • Fonction : Auteur
G. Goupil
  • Fonction : Auteur
M. Bernacki
A. Nicolaÿ

Résumé

The curtaining effect is a common challenge in focused ion beam (FIB) surface preparation. This study investigates methods to reduce this effect during plasma FIB milling of Inconel 718 (nickel‐based superalloy). Platinum deposition, silicon mask and XeF 2 gas injection were explored as potential solutions. These methods were evaluated for two ion beam current conditions; a high ion beam intensity condition (30 kV–1 µA) and a medium one (30 kV–100 nA) and their impact on curtaining reduction and resulting cross‐section quality was assessed quantitatively thanks to topographic measurements done by atomic force microscopy (AFM). XeF 2 assistance notably improved cross‐section quality at medium current level. Pt deposition and Si mask individually mitigated the curtaining effect, with greater efficacy at 100 nA. Both methods also contributed to reducing cross‐section curvature, with the Si mask outperforming Pt deposition. However, combining Pt deposition and Si mask with XeF 2 injection led to deterioration of these protective layers and the reappearance of the curtaining effect after a quite short exposure time.
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Dates et versions

hal-04607777 , version 1 (11-06-2024)

Identifiants

Citer

F. Jaime, S. Desbief, J. Silvent, G. Goupil, M. Bernacki, et al.. Study of curtaining effect reduction methods in Inconel 718 using a plasma focused ion beam. Journal of Microscopy, 2024, ⟨10.1111/jmi.13320⟩. ⟨hal-04607777⟩
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