Rapid Vapor-Phase Deposition of Oxide Overlayers on Thermally-Sensitive Device Stacks for Optoelectronics - Archive ouverte HAL Access content directly
Conference Papers Year : 2021

Rapid Vapor-Phase Deposition of Oxide Overlayers on Thermally-Sensitive Device Stacks for Optoelectronics

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hal-04426047 , version 1 (30-01-2024)

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  • HAL Id : hal-04426047 , version 1

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Rob Jagt, Virgil Andrei, Solène Béchu, Motiar Rahaman, Tahmida N Huq, et al.. Rapid Vapor-Phase Deposition of Oxide Overlayers on Thermally-Sensitive Device Stacks for Optoelectronics. Fall MRS Meeting & Exhibition, Nov 2021, Boston (Massachusetts), United States. ⟨hal-04426047⟩
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