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Article Dans Une Revue Vacuum Année : 2023

A systematical investigation of layer growth rate, impurity level and morphology evolution in TiO2 thin films grown by ALD between 100 and 300 °C

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hal-04318424 , version 1 (01-12-2023)

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Bingbing Xia, Jean-Jacques Ganem, Emrick Briand, Sébastien Steydli, Aleksandra Wanda Baron-Wiecheć, et al.. A systematical investigation of layer growth rate, impurity level and morphology evolution in TiO2 thin films grown by ALD between 100 and 300 °C. Vacuum, 2023, 216, pp.112408. ⟨10.1016/j.vacuum.2023.112408⟩. ⟨hal-04318424⟩
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