Relationship between structure and local electrical resistivity in copper grain boundaries - Archive ouverte HAL
Communication Dans Un Congrès Année : 2021
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hal-04303782 , version 1 (23-11-2023)

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  • HAL Id : hal-04303782 , version 1

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Hanna Bishara, Lena Frommeyer, Subin Lee, Tobias Brink, Matteo Ghidelli, et al.. Relationship between structure and local electrical resistivity in copper grain boundaries. European Materials Research Society (E-MRS) Spring Meeting, May 2021, Virtual conference, France. ⟨hal-04303782⟩
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