Electronic properties of rhombohedrally stacked bilayer W Se 2 obtained by chemical vapor deposition - Archive ouverte HAL
Article Dans Une Revue Physical Review B Année : 2023

Electronic properties of rhombohedrally stacked bilayer W Se 2 obtained by chemical vapor deposition

Pavel Dudin
José Avila
Mathieu Silly
Marco Pala
Julien Chaste

Résumé

Twisted layers of atomically thin two-dimensional materials support a broad range of quantum materials with engineered optical and transport properties. Transition metal dichalcogenides (TMDs) in the rhombohedral (3R, i.e., 0 • twist) crystal phase have been the focus of significant research interest in optical applications due to their particular broken inversion symmetry. Here, we report experimental and theoretical study of WSe 2 homobilayers obtained in stable 3R configuration by chemical vapor synthesis. We investigate the electronic and structural properties of these 3R WSe 2 bilayers with 3R stacking using micro-Raman spectroscopy, angleresolved photoemission nanospectroscopy measurements, and density functional theory calculations. Our results demonstrate that WSe 2 bilayers with 3R crystal phase (AB stacking) show a significant valence-band splitting at the K point estimated at 550 ± 20 meV. We derived experimentally effective hole masses of 0.48m e and 0.73m e at the K point for upper and lower bands, respectively. Our work opens up perspectives for the development of optoelectronic and spintronic devices based on 3R TMD homobilayers.
Fichier principal
Vignette du fichier
PhysRevB.108.045417 hal.pdf (1.88 Mo) Télécharger le fichier
Origine Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-04302594 , version 1 (23-11-2023)

Identifiants

Citer

Aymen Mahmoudi, Meryem Bouaziz, Anis Chiout, Gaia Di Berardino, Nathan Ullberg, et al.. Electronic properties of rhombohedrally stacked bilayer W Se 2 obtained by chemical vapor deposition. Physical Review B, 2023, 108 (4), pp.045417. ⟨10.1103/PhysRevB.108.045417⟩. ⟨hal-04302594⟩
76 Consultations
208 Téléchargements

Altmetric

Partager

More