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Journal Articles Chemical Vapor Deposition Year : 2011

Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide

Abstract

Due to numerous allotropic modifications and to the subsequent large spectrum of structure-properties relationships,aluminum oxides in the form of films and coatings are of major technological interest for a wide range of applications, e.g., optics and microelectronic components,wear resistance, catalyst support, protection against corrosion,and high temperature oxidation. Metal-organic(MO)CVD is a potentially attractive technique for the processing of such coatings, especially on complex-in-shape, temperature-sensitive parts.
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Dates and versions

hal-04289171 , version 1 (16-11-2023)

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Hugues Vergnes, Diane Samélor, Alain Gleizes, Constantin Vahlas, Brigitte Caussat. Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide. Chemical Vapor Deposition, 2011, 17 (7-9), pp.181-185. ⟨10.1002/cvde.201004301⟩. ⟨hal-04289171⟩
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