Locally Ion Implantation and Annealing Effects in Diamond
Résumé
Diamond has demonstrated interesting properties for high power applications. However numerous technological obstacles make difficult the fabrication of power devices on diamond. Diamond doping in-situ gas phase is today the most efficient technique. In fact, the possibility to dope locally by ion implantation is indispensable for establishing a diamond manufacturing chain in particular to achieve the highest possible doping.
Domaines
Physique [physics]| Origine | Fichiers produits par l'(les) auteur(s) |
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