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Communication Dans Un Congrès Année : 2023

Pulsed aerosol-assisted plasma processes for (multi)functional thin film deposition

Résumé

Pulsed aerosol injection is an appealing method to inject complex precursors in plasmas independently on their composition and thermodynamic characteristics. This method is implementable to form (multi)functional thin films in various plasma processes by pulse injecting colloidal solutions or by using a pulsed direct liquid reactor-injector of nanoparticles. However, the pulsed injection introduces new specific physics.
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Dates et versions

hal-04235794 , version 1 (11-10-2023)

Identifiants

  • HAL Id : hal-04235794 , version 1

Citer

G Carnide, L Cacot, M Feron, V Pozsgay, M L Kahn, et al.. Pulsed aerosol-assisted plasma processes for (multi)functional thin film deposition. 25th International Symposium on Plasma Chemistry - ISPC23, May 2023, Kyoto, Japan. ⟨hal-04235794⟩
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