Wafer-level vapor cells filled with laser-actuated hermetic seals for integrated atomic devices - Archive ouverte HAL
Journal Articles Microsystems & Nanoengineering Year : 2022

Wafer-level vapor cells filled with laser-actuated hermetic seals for integrated atomic devices

Abstract

Atomic devices such as atomic clocks and optically-pumped magnetometers rely on the interrogation of atoms contained in a cell whose inner content has to meet high standards of purity and accuracy. Glass-blowing techniques and craftsmanship have evolved over many decades to achieve such standards in macroscopic vapor cells. With the emergence of chip-scale atomic devices, the need for miniaturization and mass fabrication has led to the adoption of microfabrication techniques to make millimeter-scale vapor cells. However, many shortcomings remain and no process has been able to match the quality and versatility of glass-blown cells. Here, we introduce a novel approach to structure, fill and seal microfabricated vapor cells inspired from the century-old approach of glass-blowing, through opening and closing single-use zero-leak microfabricated valves. These valves are actuated exclusively by laser, and operate in the same way as the “make-seals” and “break-seals” found in the filling apparatus of traditional cells. Such structures are employed to fill cesium vapor cells at the wafer-level. The make-seal structure consists of a glass membrane that can be locally heated and deflected to seal a microchannel. The break-seal is obtained by breaching a silicon wall between cavities. This new approach allows adapting processes previously restricted to glass-blown cells. It can also be extended to vacuum microelectronics and vacuum-packaging of micro-electro-mechanical systems (MEMS) devices.
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Dates and versions

hal-04224417 , version 1 (02-10-2023)

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Vincent Maurice, Clément Carlé, Shervin Keshavarzi, Ravinder Kumar Chutani, Samuel Queste, et al.. Wafer-level vapor cells filled with laser-actuated hermetic seals for integrated atomic devices. Microsystems & Nanoengineering, 2022, 8 (129), pp.13. ⟨10.1038/s41378-022-00468-x⟩. ⟨hal-04224417⟩
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