Plasma deposition of nanocomposite thin film by using a reactor-injector of nanoparticles - Archive ouverte HAL
Communication Dans Un Congrès Année : 2017

Plasma deposition of nanocomposite thin film by using a reactor-injector of nanoparticles

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Plasmas
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Dates et versions

hal-04165055 , version 1 (18-07-2023)

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  • HAL Id : hal-04165055 , version 1

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Y. Champouret, Guillaume Carnide, E. Amin-Chalhoub, M. L. Kahn, Richard Clergereaux. Plasma deposition of nanocomposite thin film by using a reactor-injector of nanoparticles. 23rd International Symposium on Plasma Chemistry (ISPC 23), July 30-Aug. 4, 2017, Montreal (CANADA), 2017, Montreal, Canada. ⟨hal-04165055⟩
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