Conference Papers
Year : 2009
Karine Pistre : Connect in order to contact the contributor
https://hal.science/hal-04164984
Submitted on : Tuesday, July 18, 2023-3:42:19 PM
Last modification on : Monday, November 20, 2023-11:44:21 AM
Dates and versions
Identifiers
- HAL Id : hal-04164984 , version 1
Cite
Nicolas Gherardi, Louison Maechler, Ionut Enache, Nicolas Naudé, Hubert Caquineau, et al.. Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition by Homogeneous Dielectric Barrier Discharge. AVS 56th International Symposium, San-Jose USA, 2009, San-Jose, United States. ⟨hal-04164984⟩
Collections
0
View
0
Download