Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition by Homogeneous Dielectric Barrier Discharge - Archive ouverte HAL Access content directly
Conference Papers Year : 2009
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hal-04164984 , version 1 (18-07-2023)

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  • HAL Id : hal-04164984 , version 1

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Nicolas Gherardi, Louison Maechler, Ionut Enache, Nicolas Naudé, Hubert Caquineau, et al.. Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition by Homogeneous Dielectric Barrier Discharge. AVS 56th International Symposium, San-Jose USA, 2009, San-Jose, United States. ⟨hal-04164984⟩
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