<?xml version="1.0" encoding="utf-8"?>
<TEI xmlns="http://www.tei-c.org/ns/1.0" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:hal="http://hal.archives-ouvertes.fr/" xmlns:gml="http://www.opengis.net/gml/3.3/" xmlns:gmlce="http://www.opengis.net/gml/3.3/ce" version="1.1" xsi:schemaLocation="http://www.tei-c.org/ns/1.0 http://api.archives-ouvertes.fr/documents/aofr-sword.xsd">
  <teiHeader>
    <fileDesc>
      <titleStmt>
        <title>HAL TEI export of hal-04138936</title>
      </titleStmt>
      <publicationStmt>
        <distributor>CCSD</distributor>
        <availability status="restricted">
          <licence target="https://creativecommons.org/publicdomain/zero/1.0/">CC0 1.0 - Universal</licence>
        </availability>
        <date when="2026-05-03T14:32:57+02:00"/>
      </publicationStmt>
      <sourceDesc>
        <p part="N">HAL API Platform</p>
      </sourceDesc>
    </fileDesc>
  </teiHeader>
  <text>
    <body>
      <listBibl>
        <biblFull>
          <titleStmt>
            <title xml:lang="en">Cryo-ALE of Si and SiO2 using SF6 Physisorption</title>
            <author role="aut">
              <persName>
                <forename type="first">Jack</forename>
                <surname>Nos</surname>
              </persName>
              <idno type="idhal" notation="numeric">1264195</idno>
              <idno type="halauthorid" notation="string">2295118-1264195</idno>
              <idno type="ORCID">https://orcid.org/0000-0001-8199-8834</idno>
            </author>
            <author role="aut">
              <persName>
                <forename type="first">Gaelle</forename>
                <surname>Antoun</surname>
              </persName>
              <email type="md5">c9ef84949cb4b01dae93c07a3692e033</email>
              <email type="domain">univ-orleans.fr</email>
              <idno type="idhal" notation="numeric">1089289</idno>
              <idno type="halauthorid" notation="string">1668688-1089289</idno>
            </author>
            <author role="aut">
              <persName>
                <forename type="first">T.</forename>
                <surname>Tillocher</surname>
              </persName>
              <email type="md5">94fcf5ac7a6aba737654a4259711ba18</email>
              <email type="domain">univ-orleans.fr</email>
              <idno type="idhal" notation="string">thomas-tillocher</idno>
              <idno type="idhal" notation="numeric">7479</idno>
              <idno type="halauthorid" notation="string">1305818-7479</idno>
              <idno type="ORCID">https://orcid.org/0000-0002-9160-5595</idno>
              <idno type="IDREF">https://www.idref.fr/120339072</idno>
            </author>
            <author role="aut">
              <persName>
                <forename type="first">Philippe</forename>
                <surname>Lefaucheux</surname>
              </persName>
              <email type="md5">986977331ccf8193ea1fde7bfa62d638</email>
              <email type="domain">univ-orleans.fr</email>
              <idno type="idhal" notation="numeric">1248767</idno>
              <idno type="halauthorid" notation="string">167247-1248767</idno>
              <idno type="ORCID">https://orcid.org/0000-0001-7889-8891</idno>
            </author>
            <author role="aut">
              <persName>
                <forename type="first">Rémi</forename>
                <surname>Dussart</surname>
              </persName>
              <idno type="idhal" notation="string">rdussart</idno>
              <idno type="idhal" notation="numeric">175426</idno>
              <idno type="halauthorid" notation="string">36435-175426</idno>
              <idno type="ORCID">https://orcid.org/0000-0003-2001-5034</idno>
              <idno type="IDREF">https://www.idref.fr/070190968</idno>
              <affiliation ref="#struct-199965"/>
            </author>
            <author role="aut">
              <persName>
                <forename type="first">Aurélie</forename>
                <surname>Girard</surname>
              </persName>
              <idno type="halauthorid">22368-0</idno>
              <affiliation ref="#struct-491677"/>
            </author>
            <author role="aut">
              <persName>
                <forename type="first">Christophe</forename>
                <surname>Cardinaud</surname>
              </persName>
              <idno type="idhal" notation="numeric">759248</idno>
              <idno type="halauthorid" notation="string">256143-759248</idno>
              <idno type="ORCID">https://orcid.org/0000-0002-9753-8848</idno>
              <idno type="IDREF">https://www.idref.fr/060603011</idno>
            </author>
            <editor role="depositor">
              <persName>
                <forename>Rémi</forename>
                <surname>Dussart</surname>
              </persName>
              <email type="md5">8e2e4b2273fca85f5da16cacf243ae13</email>
              <email type="domain">univ-orleans.fr</email>
            </editor>
            <funder ref="#projanr-52192"/>
          </titleStmt>
          <editionStmt>
            <edition n="v1" type="current">
              <date type="whenSubmitted">2023-06-23 12:15:34</date>
              <date type="whenModified">2026-01-29 14:50:02</date>
              <date type="whenReleased">2023-06-23 12:15:34</date>
              <date type="whenProduced">2022-05-16</date>
            </edition>
            <respStmt>
              <resp>contributor</resp>
              <name key="8645">
                <persName>
                  <forename>Rémi</forename>
                  <surname>Dussart</surname>
                </persName>
                <email type="md5">8e2e4b2273fca85f5da16cacf243ae13</email>
                <email type="domain">univ-orleans.fr</email>
              </name>
            </respStmt>
          </editionStmt>
          <publicationStmt>
            <distributor>CCSD</distributor>
            <idno type="halId">hal-04138936</idno>
            <idno type="halUri">https://hal.science/hal-04138936</idno>
            <idno type="halBibtex">nos:hal-04138936</idno>
            <idno type="halRefHtml">&lt;i&gt;Plasma Cryogenic Etching Processing (PlaCEP)&lt;/i&gt;, May 2022, Orleans, France</idno>
            <idno type="halRef">Plasma Cryogenic Etching Processing (PlaCEP), May 2022, Orleans, France</idno>
            <availability status="restricted"/>
          </publicationStmt>
          <seriesStmt>
            <idno type="stamp" n="UNIV-BREST">Université de Bretagne occidentale - Brest (UBO)</idno>
            <idno type="stamp" n="GENES">Groupe des Écoles Nationales d'Économie et Statistique</idno>
            <idno type="stamp" n="UR2-HB">Université Rennes 2 - Haute Bretagne</idno>
            <idno type="stamp" n="CNRS">CNRS - Centre national de la recherche scientifique</idno>
            <idno type="stamp" n="UNIV-ORLEANS">Université d'Orléans</idno>
            <idno type="stamp" n="UNIV-UBS">Université de Bretagne Sud</idno>
            <idno type="stamp" n="ENSAI" corresp="GENES">Ensai, Ecole Nationale de la Statistique et de l'Analyse de l'Information</idno>
            <idno type="stamp" n="GREMI" corresp="UNIV-ORLEANS">Publications du GREMI</idno>
            <idno type="stamp" n="UNIV-RENNES2">Université Rennes 2</idno>
            <idno type="stamp" n="UNIV-RENNES">Université de Rennes</idno>
            <idno type="stamp" n="INSTITUTS-TELECOM">composantes instituts telecom </idno>
            <idno type="stamp" n="ANR">ANR</idno>
          </seriesStmt>
          <notesStmt>
            <note type="audience" n="2">International</note>
            <note type="popular" n="0">No</note>
            <note type="peer" n="1">Yes</note>
            <note type="proceedings" n="0">No</note>
          </notesStmt>
          <sourceDesc>
            <biblStruct>
              <analytic>
                <title xml:lang="en">Cryo-ALE of Si and SiO2 using SF6 Physisorption</title>
                <author role="aut">
                  <persName>
                    <forename type="first">Jack</forename>
                    <surname>Nos</surname>
                  </persName>
                  <idno type="idhal" notation="numeric">1264195</idno>
                  <idno type="halauthorid" notation="string">2295118-1264195</idno>
                  <idno type="ORCID">https://orcid.org/0000-0001-8199-8834</idno>
                </author>
                <author role="aut">
                  <persName>
                    <forename type="first">Gaelle</forename>
                    <surname>Antoun</surname>
                  </persName>
                  <email type="md5">c9ef84949cb4b01dae93c07a3692e033</email>
                  <email type="domain">univ-orleans.fr</email>
                  <idno type="idhal" notation="numeric">1089289</idno>
                  <idno type="halauthorid" notation="string">1668688-1089289</idno>
                </author>
                <author role="aut">
                  <persName>
                    <forename type="first">T.</forename>
                    <surname>Tillocher</surname>
                  </persName>
                  <email type="md5">94fcf5ac7a6aba737654a4259711ba18</email>
                  <email type="domain">univ-orleans.fr</email>
                  <idno type="idhal" notation="string">thomas-tillocher</idno>
                  <idno type="idhal" notation="numeric">7479</idno>
                  <idno type="halauthorid" notation="string">1305818-7479</idno>
                  <idno type="ORCID">https://orcid.org/0000-0002-9160-5595</idno>
                  <idno type="IDREF">https://www.idref.fr/120339072</idno>
                </author>
                <author role="aut">
                  <persName>
                    <forename type="first">Philippe</forename>
                    <surname>Lefaucheux</surname>
                  </persName>
                  <email type="md5">986977331ccf8193ea1fde7bfa62d638</email>
                  <email type="domain">univ-orleans.fr</email>
                  <idno type="idhal" notation="numeric">1248767</idno>
                  <idno type="halauthorid" notation="string">167247-1248767</idno>
                  <idno type="ORCID">https://orcid.org/0000-0001-7889-8891</idno>
                </author>
                <author role="aut">
                  <persName>
                    <forename type="first">Rémi</forename>
                    <surname>Dussart</surname>
                  </persName>
                  <idno type="idhal" notation="string">rdussart</idno>
                  <idno type="idhal" notation="numeric">175426</idno>
                  <idno type="halauthorid" notation="string">36435-175426</idno>
                  <idno type="ORCID">https://orcid.org/0000-0003-2001-5034</idno>
                  <idno type="IDREF">https://www.idref.fr/070190968</idno>
                  <affiliation ref="#struct-199965"/>
                </author>
                <author role="aut">
                  <persName>
                    <forename type="first">Aurélie</forename>
                    <surname>Girard</surname>
                  </persName>
                  <idno type="halauthorid">22368-0</idno>
                  <affiliation ref="#struct-491677"/>
                </author>
                <author role="aut">
                  <persName>
                    <forename type="first">Christophe</forename>
                    <surname>Cardinaud</surname>
                  </persName>
                  <idno type="idhal" notation="numeric">759248</idno>
                  <idno type="halauthorid" notation="string">256143-759248</idno>
                  <idno type="ORCID">https://orcid.org/0000-0002-9753-8848</idno>
                  <idno type="IDREF">https://www.idref.fr/060603011</idno>
                </author>
              </analytic>
              <monogr>
                <meeting>
                  <title>Plasma Cryogenic Etching Processing (PlaCEP)</title>
                  <date type="start">2022-05-16</date>
                  <date type="end">2022-05-19</date>
                  <settlement>Orleans</settlement>
                  <country key="FR">France</country>
                </meeting>
                <imprint/>
              </monogr>
            </biblStruct>
          </sourceDesc>
          <profileDesc>
            <langUsage>
              <language ident="en">English</language>
            </langUsage>
            <textClass>
              <classCode scheme="halDomain" n="phys">Physics [physics]</classCode>
              <classCode scheme="halTypology" n="COMM">Conference papers</classCode>
              <classCode scheme="halOldTypology" n="COMM">Conference papers</classCode>
              <classCode scheme="halTreeTypology" n="COMM">Conference papers</classCode>
            </textClass>
            <abstract xml:lang="en">
              <p>Cryogenic Atomic Layer Etching (Cryo-ALE) using C4F8 as a precursor gas has beenpreviously presented as an alternative method to achieve ALE of SiO2. In this process, C4F8 isinjected in gas phase during the “chemical modification” step, in order to physisorb on a cooledSiO2 surface. The etching step is then achieved using an Ar plasma with a low energy ionbombardment. The temperature window of this process was between -120°C and -90°C 1,2.However, C4F8 injection at cryogenic temperatures does not allow high etching selectivity ofSiO2 over Si and Si3N4 as the deposited CFx passivation layer is not thick enough to efficientlypassivate Si and Si3N4 surfaces. As a result, another gas chemistry has to be tested in order toachieve higher etching selectivity.In 1996, Royer et al. studied the chemisorption of sulfur and fluorine on Si during asimultaneous exposure to SF6 gas and Ne+ ion beam. In this work, they showed by XPSmeasurements that the fluorine quantity on the Si surface tends to increase as the temperaturedecreases, for a process window between 20°C and -130°C 3. Therefore cryo-ALE study basedon SF6 physisorption was carried out to extend the use of this alternative approach to other materials.This work was carried out using a cryogenic ICP reactor equipped with in-situ diagnostics.Mass spectrometry measurements enabled to characterize the SF6 physisorption and its surfaceresidence time at different temperatures. Spectroscopic ellipsometry was used to monitor theetching rate and to characterize the sample surface at the nanoscale during the three processsteps: SF6 physisorption, pumping and Ar plasma etching. Tests were performed on SiO2, Si3N4and p-Si coupons glued on SiO2 6” carrier wafers.SF6 physisorption experiments will first be studied and presented notably to find the optimaltemperature and purging time for the process. Subsequently, cryo-ALE test results on Si, SiO2and Si3N4 will be shown. These results will finally be compared to the ones obtained previouslyusing C4F8 physisorption.This research project is supported by the CERTeM 2020 platform, which provides most of theequipment and funded by the European Union (FEDER fund) as well as the French NationalResearch Agency (ANR PSICRYO fund).1. Antoun et al., Appl. Phys. Lett. 115, 153109, 20192. Antoun et al., Sci. Rep. 10, 20213. Royer et al., J. Vac. Sci. Technol. A 14, 234–239, 1996</p>
            </abstract>
          </profileDesc>
        </biblFull>
      </listBibl>
    </body>
    <back>
      <listOrg type="structures">
        <org type="laboratory" xml:id="struct-199965" status="VALID">
          <idno type="IdRef">195138678</idno>
          <idno type="ISNI">0000000085172151</idno>
          <idno type="RNSR">201220227N</idno>
          <idno type="ROR">https://ror.org/042ds2135</idno>
          <orgName>Groupe de recherches sur l'énergétique des milieux ionisés</orgName>
          <orgName type="acronym">GREMI</orgName>
          <date type="start">2012-01-01</date>
          <desc>
            <address>
              <addrLine>14 Rue d'Issoudun - BP 6744 45067 ORLEANS CEDEX 2</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">http://www.univ-orleans.fr/gremi/</ref>
          </desc>
          <listRelation>
            <relation name="UMR 7344" active="#struct-300297" type="direct"/>
            <relation name="UMR7344" active="#struct-441569" type="direct"/>
          </listRelation>
        </org>
        <org type="regrouplaboratory" xml:id="struct-491677" status="VALID">
          <orgName>Môle Armoricain de Recherche sur la SOciété de l'information et des usages d'INternet</orgName>
          <orgName type="acronym">MARSOUIN</orgName>
          <date type="start">2002-01-11</date>
          <desc>
            <address>
              <addrLine>Môle Armoricain de Recherche sur la SOciété de l'information et des usages d'INternet - Technopôle Brest Iroise - CS 83818 - 29238 BREST Cedex 3</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">http://www.marsouin.org</ref>
          </desc>
          <listRelation>
            <relation active="#struct-105160" type="direct"/>
            <relation active="#struct-172265" type="direct"/>
            <relation active="#struct-244399" type="direct"/>
            <relation active="#struct-302088" type="indirect"/>
            <relation active="#struct-300314" type="direct"/>
            <relation active="#struct-302102" type="direct"/>
            <relation active="#struct-406201" type="direct"/>
            <relation active="#struct-469973" type="direct"/>
            <relation active="#struct-481355" type="direct"/>
          </listRelation>
        </org>
        <org type="institution" xml:id="struct-300297" status="VALID">
          <idno type="IdRef">026402971</idno>
          <idno type="ISNI">0000 0001 2158 1666</idno>
          <idno type="ROR">https://ror.org/014zrew76</idno>
          <orgName>Université d'Orléans</orgName>
          <orgName type="acronym">UO</orgName>
          <desc>
            <address>
              <addrLine>Château de la Source - Avenue du Parc Floral - BP 6749 - 45067 Orléans cedex 2</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">http://www.univ-orleans.fr/</ref>
          </desc>
        </org>
        <org type="regroupinstitution" xml:id="struct-441569" status="VALID">
          <idno type="IdRef">02636817X</idno>
          <idno type="ISNI">0000000122597504</idno>
          <idno type="ROR">https://ror.org/02feahw73</idno>
          <orgName>Centre National de la Recherche Scientifique</orgName>
          <orgName type="acronym">CNRS</orgName>
          <date type="start">1939-10-19</date>
          <desc>
            <address>
              <country key="FR"/>
            </address>
            <ref type="url">https://www.cnrs.fr/</ref>
          </desc>
        </org>
        <org type="institution" xml:id="struct-105160" status="VALID">
          <idno type="IdRef">26693823X</idno>
          <idno type="ROR">https://ror.org/015m7wh34</idno>
          <orgName>Université de Rennes</orgName>
          <orgName type="acronym">UR</orgName>
          <desc>
            <address>
              <addrLine>Campus de Beaulieu, 263 avenue Général Leclerc, CS 74205, 35042 RENNES CEDEX</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">https://www.univ-rennes.fr/</ref>
          </desc>
        </org>
        <org type="institution" xml:id="struct-172265" status="VALID">
          <idno type="IdRef">05017746X</idno>
          <idno type="ISNI">0000000121680285</idno>
          <idno type="ROR">https://ror.org/04ed7fw48</idno>
          <orgName>Université de Bretagne Sud</orgName>
          <orgName type="acronym">UBS</orgName>
          <date type="start">1995-02-07</date>
          <desc>
            <address>
              <addrLine>BP 92116 - 56321 Lorient cedex</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">http://www.univ-ubs.fr/</ref>
          </desc>
        </org>
        <org type="institution" xml:id="struct-244399" status="VALID">
          <idno type="ROR">https://ror.org/00k206f19</idno>
          <orgName>Ecole Nationale de la Statistique et de l'Analyse de l'Information [Bruz]</orgName>
          <orgName type="acronym">ENSAI</orgName>
          <desc>
            <address>
              <addrLine>Campus de Ker-Lann Rue Blaise Pascal BP 37203 35172 BRUZ cedex</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">http://www.ensai.fr/</ref>
          </desc>
          <listRelation>
            <relation active="#struct-302088" type="direct"/>
          </listRelation>
        </org>
        <org type="regroupinstitution" xml:id="struct-302088" status="VALID">
          <orgName>Groupe des Écoles Nationales d'Économie et Statistique</orgName>
          <orgName type="acronym">Groupe ENSAE-ENSAI</orgName>
          <desc>
            <address>
              <addrLine>5, avenue Henry Le Chatelier 91120 Palaiseau</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">https://www.ensae-ensai.fr</ref>
          </desc>
        </org>
        <org type="regroupinstitution" xml:id="struct-300314" status="VALID">
          <idno type="IdRef">291809022</idno>
          <idno type="ISNI">0000000121880893</idno>
          <idno type="ROR">https://ror.org/0372th171</idno>
          <orgName>Université de Brest</orgName>
          <orgName type="acronym">UBO EPE</orgName>
          <desc>
            <address>
              <addrLine>Université de Bretagne Occidentale - 3 Rue des Archives 29238, Brest</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">https://www.univ-brest.fr/</ref>
          </desc>
        </org>
        <org type="regroupinstitution" xml:id="struct-302102" status="VALID">
          <idno type="IdRef">192427156</idno>
          <idno type="ISNI">000000012202567X</idno>
          <idno type="ROR">https://ror.org/025vp2923</idno>
          <idno type="Wikidata">Q27962533</idno>
          <orgName>Institut Mines-Télécom [Paris]</orgName>
          <orgName type="acronym">IMT</orgName>
          <date type="start">2012-03-01</date>
          <desc>
            <address>
              <addrLine>19 Place Marguerite Perey, 91120 Palaiseau</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">https://www.imt.fr/</ref>
          </desc>
        </org>
        <org type="institution" xml:id="struct-406201" status="VALID">
          <idno type="IdRef">054447658</idno>
          <idno type="ISNI">0000000121522279</idno>
          <idno type="ROR">https://ror.org/01m84wm78</idno>
          <orgName>Université de Rennes 2</orgName>
          <orgName type="acronym">UR2</orgName>
          <desc>
            <address>
              <addrLine>Place du recteur Henri Le Moal - CS 24307 - 35043 Rennes cedex</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">http://www.univ-rennes2.fr/</ref>
          </desc>
        </org>
        <org type="regroupinstitution" xml:id="struct-469973" status="VALID">
          <idno type="IdRef">191639044</idno>
          <idno type="ROR">https://ror.org/04x1a4s97</idno>
          <orgName>Université Bretagne Loire</orgName>
          <orgName type="acronym">UBL</orgName>
          <date type="start">2016-04-01</date>
          <desc>
            <address>
              <addrLine>Cité Internationale, 1 place Paul Ricoeur - CS 54417 35044 RENNES CEDEX</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">https://u-bretagneloire.fr/</ref>
          </desc>
        </org>
        <org type="institution" xml:id="struct-481355" status="VALID">
          <idno type="IdRef">202743233</idno>
          <idno type="ROR">https://ror.org/030hj3061</idno>
          <orgName>IMT Atlantique</orgName>
          <orgName type="acronym">IMT Atlantique</orgName>
          <date type="start">2017-01-01</date>
          <desc>
            <address>
              <addrLine>Campus Brest : Technopôle Brest-Iroise CS 8381829238 BREST Cedex 3 -Campus Nantes : 4, rue Alfred Kastler- La chantrerie 44300 NANTES -Campus Rennes :  2 Rue de la Châtaigneraie, 35510 CESSON SEVIGNE</addrLine>
              <country key="FR"/>
            </address>
            <ref type="url">https://www.imt-atlantique.fr</ref>
          </desc>
          <listRelation>
            <relation active="#struct-302102" type="direct"/>
          </listRelation>
        </org>
      </listOrg>
      <listOrg type="projects">
        <org type="anrProject" xml:id="projanr-52192" status="VALID">
          <idno type="anr">ANR-20-CE24-0014</idno>
          <orgName>PSICRYO</orgName>
          <desc>Etude fondamentale des interactions plasma-surface dans les procédés de gravure cryogénique avancés</desc>
          <date type="start">2020</date>
        </org>
      </listOrg>
    </back>
  </text>
</TEI>