Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Journal of Vacuum Science & Technology A Année : 2023

Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

Ashok-Kumar Yadav
Gianluca Ciatto

Résumé

Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H2 (5%) atmosphere at mild temperature (300°C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy.
Fichier principal
Vignette du fichier
Revised version JVST A.pdf (5.18 Mo) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-04138018 , version 1 (31-10-2023)

Identifiants

Citer

Petros Abi Younes, Ashok-Kumar Yadav, Medet Zhukush, Van-Hoan Le, Hervé Roussel, et al.. Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film. Journal of Vacuum Science & Technology A, 2023, 41 (4), ⟨10.1116/6.0002448⟩. ⟨hal-04138018⟩
37 Consultations
20 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More