Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactor - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2005

Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactor

Résumé

Chemical vapor deposition (CVD) using precursors that are solids at operating temperatures and pressures, presents challenges due to their relatively low vapor pressures. In addition, the sublimation rates of solid state precursors in fixed bed reactors vary with particle and bed morphology. In a recent patent application, the use of fluidized bed (FB) technology has been proposed to provide high, reliable, and reproducible flux of such precursors in CVD processes. In the present contribution, we first focus on the reactor design which must satisfy fluidization,sublimation and CVD reactor feeding constraints. Then, we report masstransport results on the sublimation of aluminium acetylacetonate, a common precursor for the CVD of alumina films. Finally, we discuss the efficiency of the precursor feeding rate, we address advantages and drawbacks of the invention and we propose design modifications in order to meet the process requirements.
Fichier principal
Vignette du fichier
Vahlas_1287.pdf (596.79 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-04038745 , version 1 (21-03-2023)

Identifiants

  • HAL Id : hal-04038745 , version 1
  • OATAO : 1287

Citer

Constantin Vahlas, Brigitte Caussat, François Senocq, Wayne L. Gladfelter, Christos Sarantopoulos, et al.. Fluidized bed as a solid precursor delivery system in a chemical vapor deposition reactor. Fifteenth European Conference on Chemical Vapor Deposition, EUROCVD-15, Sep 2005, Bochum, Germany. pp.221-228. ⟨hal-04038745⟩
15 Consultations
15 Téléchargements

Partager

Gmail Facebook X LinkedIn More