Memory effect in a Dielectric Barrier Discharge in N2/O2 mixture : absolute atom density measurements by Two-photon Absorption Laser-Induced Fluorescence (TALIF) spectroscopy - Archive ouverte HAL
Communication Dans Un Congrès Année : 2017

Memory effect in a Dielectric Barrier Discharge in N2/O2 mixture : absolute atom density measurements by Two-photon Absorption Laser-Induced Fluorescence (TALIF) spectroscopy

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https://hal.science/hal-03987801

Soumis le : mardi 14 février 2023-11:03:31

Dernière modification le : samedi 27 avril 2024-03:11:07

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hal-03987801 , version 1 (14-02-2023)

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  • HAL Id : hal-03987801 , version 1

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Xi Lin, Clémence Tyl, Nicolas Naudé, Simon Dap, Nicolas Gherardi. Memory effect in a Dielectric Barrier Discharge in N2/O2 mixture : absolute atom density measurements by Two-photon Absorption Laser-Induced Fluorescence (TALIF) spectroscopy. XXXIII International Conference on Phenomena in Ionized Gases (ICPIG 2017), July 9-14, 2017, Estoril (PORTUGAL), 2017, Estoril, Portugal. ⟨hal-03987801⟩

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