Titanium nitride / porous silicon electrode for microsupercapacitor applications
Résumé
This abstract deals with the investigation of a tunable way to prepare integrated micro-supercapacitors made of coated porous silicon (pSi). pSi allows developing a large specific surface area of the electrode material. To overcome the insulating behavior of the pSi, we chose to use Atomic Layer Deposition (ALD) to deposit a 2 nm thin layer of Titanium Nitride (TiN), to cover the pore sidewalls. SEM characterizations have been realized to confirm the conformal deposition of the conductive layer inside the porosity and electrochemical characterizations were carried out to determine the performances of supercapacitors. Capacity around 500 µF/cm² were obtained in Na2SO4 1M aqueous media.
Domaines
MatériauxOrigine | Fichiers produits par l'(les) auteur(s) |
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