Theory and molecular simulations of plasma sputtering, transport and deposition processes - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue (Article De Synthèse) The European Physical Journal D : Atomic, molecular, optical and plasma physics Année : 2023

Theory and molecular simulations of plasma sputtering, transport and deposition processes

Résumé

The present review provides an overview of the basic theory of sputtering with recent models, focussing in particular on sputtered atom energy distribution functions. Molecular models such as Monte-Carlo, kinetic Monte-Carlo, and classical Molecular Dynamics simulations are presented due to their ability to describe the various processes involved in sputter deposition at the atomic and molecular scale as required. The sputter plasma, the sputtering mechanisms, the transport of sputtered material and its deposition leading to thin film growth can be addressed using these molecular simulations. In all cases, the underlying methodologies and some selected mechanisms are highlighted.
Fichier principal
Vignette du fichier
ReviewTheoryMDMCsputt-EPJD_vf.pdf (4.47 Mo) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-03921537 , version 1 (03-01-2023)

Identifiants

Citer

Pascal Brault, Anne-Lise Thomann, Marjorie Cavarroc. Theory and molecular simulations of plasma sputtering, transport and deposition processes. The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2023, 77 (2), pp.19. ⟨10.1140/epjd/s10053-023-00592-x⟩. ⟨hal-03921537⟩
71 Consultations
280 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More