Widely Tunable High-Q SIW Filter using Plasma Material - Archive ouverte HAL
Communication Dans Un Congrès Année : 2010

Widely Tunable High-Q SIW Filter using Plasma Material

Résumé

This paper presents a novel concept to tune the resonant frequency of an evanescent-mode substrate integrated waveguide resonator while maintaining a high-Q in the tuned frequency range. The tunability is based on the insertion of vertical switchable capacitive post within SIW cavity. The filter is tuned from 18GHz to 7.5GHz, with insertion losses ranging from 0.8 to 2 dB in the frequency range for 1.4% bandwidth filter. The main interest of this work is the use of the argon material under high pressure and DC voltage to generate a dense plasma media.

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Dates et versions

hal-03883460 , version 1 (03-12-2022)

Identifiants

  • HAL Id : hal-03883460 , version 1

Citer

Abdelmadjid Djermoun, Gaëtan Prigent, Nathalie Raveu, Thierry Callegari. Widely Tunable High-Q SIW Filter using Plasma Material. IEEE International Microwave Symposium (IMS), Anaheim, USA, 2010, Anaheim, United States. ⟨hal-03883460⟩
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