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Article Dans Une Revue Physics of Plasmas Année : 2016

Electrical method for the measurements of volume averaged electron density and effective coupled power to the plasma bulk

Résumé

Nanoparticles growing or injected in a low pressure cold plasma generated by a radiofrequency capacitively coupled capacitive discharge induce strong modifications in the electrical parameters of both plasma and discharge. In this paper, a non-intrusive method, based on the measurement of the plasma impedance, is used to determine the volume averaged electron density and effective coupled power to the plasma bulk. Good agreements are found when the results are compared to those given by other well-known and established methods.

Domaines

Plasmas
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Dates et versions

hal-03828342 , version 1 (25-10-2022)

Identifiants

Citer

M. Henault, Gaëtan Wattieaux, T. Lecas, J. P. Renouard, L. Boufendi. Electrical method for the measurements of volume averaged electron density and effective coupled power to the plasma bulk. Physics of Plasmas, 2016, 23 (2), pp.023504. ⟨10.1063/1.4941592⟩. ⟨hal-03828342⟩
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