3D shaping of multi-layers stack using a single plasma etching step and greyscaleelectron-beam lithography - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2022
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hal-03822958 , version 1 (20-10-2022)

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  • HAL Id : hal-03822958 , version 1

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R. Dawant, Serge Ecoffey, Dominique Drouin. 3D shaping of multi-layers stack using a single plasma etching step and greyscaleelectron-beam lithography. 65th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, May 2022, New Orleans, United States. ⟨hal-03822958⟩
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