H-atom interaction with amorphous carbon films: Effect of surface temperature, H flux and exposure time - Archive ouverte HAL
Article Dans Une Revue AIP : Journal of Applied Physics Année : 2010

H-atom interaction with amorphous carbon films: Effect of surface temperature, H flux and exposure time

Résumé

In the present paper, we study the interaction between atomic hydrogen generated in a microwave afterglow with amorphous hydrogenated carbon films. A simple surface model is described and compared with the experimental results. Erosion rate is time dependent and exhibits a transient regime before reaching a constant value. Estimate of the modified film thickness by ellipsometry shows that thickness increases with time and becomes constant and equal to 1.4 nm when reaching the permanent regime. In addition, this limit is independent on the conditions, e.g., on hydrogen flux and temperature. Erosion rate depends linearly on hydrogen flux arriving at the surface and shows an exponential increase with surface temperature. A simple model proposed in the paper is in good agreement with the experimental data and allows giving an estimate of the erosion activation energy Ea=0.2 eV. This value is in agreement with the energy involved in the reaction between hydrogen atom and carbon atom in sp3 hybridization.
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Dates et versions

hal-03815902 , version 1 (15-10-2022)

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Amine Erradi, Richard Clergereaux, Freddy Gaboriau. H-atom interaction with amorphous carbon films: Effect of surface temperature, H flux and exposure time. AIP : Journal of Applied Physics, 2010, 107 (9), pp.093305 - 093305-6. ⟨10.1063/1.3369286⟩. ⟨hal-03815902⟩
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